Make&Model: CARL ZEISS UHR FESEM MODEL GEMINI SEM 500 KMAT
Specification:
Source: Schottky field emitter
Probe Current: 3pA to 100nA
Resolution: 0.8 nm
Max. weight of the sample: 0.5 kg
Magnification: 50X to 2000000X
Mode: Only high vacuum (HV)
Accessories available: EDAX, BSE
Applications: Surface morphology, Elemental analysis, Particle size distribution
Sample: Solid, Powder, Dry biological samples.
FESEM Requisition form (External): Download

Make&Model: Quoram Sputter Coater Q150R S Plus
Specification:
Sputter coaters are used to deposit a thin metal layer on the surface of a sample/substrate for SEM and EDS applications.
Sputtering: 0–80 mA to a pre-determined thickness (with optional FTM) or by the built-in timer
Film Thickness: Electrically conductive, with a thickness of 3 - 20 nm
The sputtering time: Maximum 60 minutes (without breaking vacuum and with built in cooling periods)
Specimen stage: 50 mm Ø rotation stage
Rotation speed: 8-20 RPM
Typical ultimate vacuum: ∼2x10-2 mbar in a clean system after pre-pumping with dry nitrogen gas
Sample: Solid, Powder, Dry biological samples.
Sputter Coater Requisition form (External): Download

Make & Model: Bruker D8 Advance A25
Specification:
X-Ray Source: 2.2 kW Cu anode long fine focus ceramic X-ray tube
Running condition power supply: 40 kV and 40 mA

• Max. sample weight, depending on sample holder: 250 g
• Max. sample height, depending on sample holder: 25 mm
• Max. sample diameter: 70 mm

Applications:

• Phase Composition of a Sample
  • Quantitative Phase Analysis: determine the relative amounts of phases in a mixture by referencing the relative peak intensities.
• Unit cell lattice parameters and Bravais lattice symmetry
  • Index peak positions
  • Lattice parameters can vary as a function of, and therefore give you information about, alloying, doping, solid solutions, strains, etc.
• Residual Strain (macrostrain)
• Crystal Structure
  • By Rietveld refinement of the entire diffraction pattern
• Epitaxy/Texture/Orientation
• Variable temperature analysis
• Capillary measurements
• Crystallite Size and Micro strain
  • Indicated by peak broadening.
  • Other defects (stacking faults, etc.) can be measured by analysis of peak shapes and peak width.
Sample: Solid, Thin films and powder
PXRD Requisition form (External): Download

Make&Model: Bruker, Dimension Icon
Specification:
• Sample Size: 210mm vacuum chuck for samples, ≤ 210mm diameter, ≤15mm thick
• X-Y Position Noise: ≤0.15nm RMS typical imaging bandwidth (up to 625Hz)
• Z Sensor Noise Level: 35pm RMS typical imaging bandwidth (up to 625Hz)
• X-Y Imaging Area: 90µm x 90µm typical
• Z range: 10µm typical in imaging and force curve modes
Applications:
• Identification of surface topography.
• Identification of nature of interaction between specific atom and its neighbouring.
• Electric properties can be measured by using conducting probes.
• Work function measurement using KPFM.
• Atomic level manipulations can also be done.
Sample:
AFM Requisition form (External): Download

Make&Model: Struers LectroPol-5
Applications: Electropolishing is an efficient materialographic technique for materials investigation in high resolution microscopy, where any mechanical artifacts from sample preparation are unacceptable. This eliminates the surface deformation.
Sample: Solid
Electro polishing machine Requisition form (External): Download

Make&Model: Agilent 6545XT AdvanceBio LC/Q-TOF
Specifications: MS Sensitivity (Positive) Signal to Noise Ratio for 1 pg injection for reserpine: > 500:1 RMS in 10 replicates
MS Accuracy (Positive) Measured at the (M+H) ion of reserpine using an internal mass reference : < 0.8 ppm RMS in 10 replicates
MS Sensitivity (Negative) Signal to Noise Ratio for 1 pg injection for chloramphenicol : > 500:1 RMS in 10 replicates
MS Accuracy (Negative) Measured at the (M+H) ion of chloramphenicol using an internal mass reference : < 0.8 ppm RMS in 10 replicates
MS/MS Sensitivity : >1,500:1 RMS in 10 replicates
MS/MS Accuracy (Positive) : <2.0 ppm RMS in 10 replicates
MS/MS Accuracy (Negative) : <2.5 ppm RMS in 10 replicates
Intact protein accuracy : <10 ppm RMS in 10 replicates
Mass resolving power : >50,000 FWHM at m/z 2,722
Dynamic range: Up to 5 decades
Mass Range: 50-3000 m/z
Temperature stability Maintain 1 ppm mass accuracy (Variation < 3°C from calibration temperature) : 15 to 35°C at constant temperature
Spectral acquisition rate, MS: 50 spectra/second
Spectral acquisition rate, MS/MS : 30 spectra/second
Polarity switching : 1.5 seconds with proper configuration
Applications: To analyze the mass of the liquid sample. Chromatography analysis. Intact Protein Analysis, Peptide Sequence Mapping, Glycan Profiling. For food, pharmaceutical, petrochemical and environmental application fields.
Sample: Liquid
UHPLC-HRMS Job Requisition Form (External):Download

Make&Model: Moorfield Minilab S060A RF DC HiPIMS Sputtering System
Specifications:
Sputtering sources: 4x2” and 1x3”flexi-head magnetron.
Vacuum chamber size : 400 mm ×400 mm (front face profile) × 400 mm.
Main chamber vacuum & pumping performance: Base pressure better than 5 ×10-7 mbar for routine, conditioned use.
Load Lock chamber vacuum & pumping performance: Base pressure better than 5 × 10-7 mbar for routine, conditioned use.
Process chamber volume : 60 litre (internal).
Process chamber viewports: Two 90 mm diameter view ports.
Pump pressure operation : Atmosphere to 10-9 mbar.
Substrate stage: For 4”/ 100mm diameter substrate.
Applications: Suitable for thin film coating substrates with various types of material including metals and dielectrics.
Sample: Solid
Multi-target sputtering Job Requisition Form (External):Download

Make&Model: NIKON LASER SCANNING CONFOCAL MICROSCOPE MODEL AXR
Specifications:
ECLIPSE Ti2 -Main body with intermediate magnification changer 1.5 x
Manually switchable (Magnification detector exchangeable from 1.5 x to 2.0 x)
Light distribution : 100 eyepiece, 100 Left port, 100 Right port and Eyepiece 20%/ left80%
Eyepiece tube & eyepieces: CFI 10x W/diopterabjustment (EOV 22mm)
Motorized Universal condenser: Supplied with ND 128 filter module x1, Blind module x1
Motorized Universal condenser: Position-7 (4 for φ 37mm, 3 for φ39mm)
DC Slider: 10x to 60x
Dual scanner frame rate : 10 FPS at Galvo mode at 512x512)
2Kx2K Resonant scanner capacity: 25 mm FOV
Available fluorescent filters based on dyes are DAPI, FITC, TRITC, Cy5.
Applications: To analyze the 3D image reconstruction of a sample, In the field of biological studies, Multi-colour imaging, Tile scanning to image different parts of the sample automatically over long durations.
Sample:Solid, Liquid, Bio-Sample
Confocal Laser Scanning Microscope Job Requisition Form (External):Download

Make&Model: Durham Magneto Optics Ltd/ DMO_ML3 PRO
Specifications: Light Source: Dual wavelength light source having 2 Long life semiconductor LEDs.
Available wavelengths: By, the wavelength choice is 365nm and 405nm (default)
Resolutions across full writing area: 0.6µm, 1µm, 2µm and 5µm.
Maximum wafer size : 230 mm X 230 mm X 15 mm
Kind of photoresists: G,H and I band resists
No minimum wafer size: 195mm x 195mm maximum writing area
Line Width uniformity: 70 nm
Edge Roughness: ± 30 nm
Level to level Alignment accuracy : ≤ 500 nm
Extremely fast writing speed (up to):
17 mm2/minute (0.6µm resolution),
50mm2/minute (1µm resolution),
120mm2/minute (2µm resolution) and
180mm2/minute (5µm resolution).
Grey scale exposure mode for 3‐dimensional patterning (256 grey levels)
Sample Stage resolution: 4 nm
Microscope image number of pixels: 1280 X 1024
Real time CCD microscope with 0.5 µ resolution
High quality infinite conjugate optical microscope camera with x3 aspheric objective lens and x5, x10 and x20 Olympus plan achromatic objective lens
Yellow light illumination for alignment to lithographic markers on the wafer.

Applications: Used to project or focal-spot write the image pattern onto a chemical resist-coated substrate (e.g. wafer) by means of UV radiation or electron beam. Used in micro fluid, preparation of Nano chip and electronics area.
Sample: Solid, Polymer, Gel types sample.
Solid, Polymer, Gel types sample.
Photolithography Job Requisition Form (External):Download

Make&Model: Bruker & ASCEND Advance NEO 600 MHz
Specification:
Magnet system: ASCEND 600 MHz SB ULH
Features:
- Standard Bore type (SB) with 54 mm bore size
- Operating field 14.1 T
- Very high field stability with a guaranteed drift rate of <10 ppb/hr
- Extreme small fringe field in vertical and horizontal direction
- Cryo shim system with 9 orthogonal shims
- Ultra long hold time of helium with >1 year
An inverse triple resonance high resolution probe fitted with an actively shielded single axis Z-gradient for 3 mm sample diameters and 600 MHz standard-bore magnets: iProbe BBFO 5mm BBF/1H (low-F) and PROBE TBI-C 5mm 1H/13C/BB
NMR Job Requisition form (External): Download

Make&Model: JEOL & JEM-F200 (CF-HR)
Specification:
Point Resolution: - 0.23 nm
Line/ Lattice Resolution - 0.10 nm
STEM Resolution - 0.16 nm
Magnification: TEM: 1000 x to 2.0 Mx, STEM: 10000 to x150 Mx
Electron gun - Cold FEG
Accelerating Voltage : 20 to 200KV (80KV and 200KV are standard)
Probe current - 2.5 nA at 0.7 nm
Tilt angle (X/Y): Range of +- 40/30 degree. With the tomography holder +- 80 degrees is the tilt range.
Optional accessories: Energy dispersive X-ray spectrometer (EDS), electron energy loss spectrometer (EELS), digital camera
HRTEM Job Requisition form (External): Download

Make&Model: Bruker/ D8 QUEST
Specification:
MOTORIZED DETECTOR TRACK WITH OPTICAL ENCODER
- Sample to detector distance: 28 - 240 mm
- Speed: 0 - 900 mm/min
- Accuracy: better than 50 micrometer
- Reproducibility: better than 10 micrometer
SOURCE IμS 3.0 MOLYBDENUM (MO) RADIATION
- Mo-anode, one X-ray window, spot focus
- Take off-angle: 3.5 degrees
- Voltage: Maximum 50 kV
- X-ray window: Beryllium
PINHOLE COLLIMATOR- 0.8 MM
SC-XRDJob Requisition form (External): Download

Make&Model: Agilent Technologies/ 5800 ICP-OES (Trace element detection tool)
Specification:
The ICP-OES spectrometer: To determine the elements in diverse kinds of samples
RF Generator: solid state Free Running with 40 or 27 MHz frequency
Power output stability: 1000 - 1500 Watts 1 watt increments in both Radial for, Axial, and dual view analysis with auto tuning.
Power efficiency of RF generator: be greater than 79% with < 0.1% variation in output power stability.
Plasma flow gas consumption: ICP-OES instrument should be 8L/min or less for an aqueous sample.
Nebulizer argon gas flow: variable between 0 and 2.0 L/min in 0.01 L/min increments.
OPTICS: dual monochromator/polychromator based Spectrometer with Echelle Grating and Optical Resolution of minimum 0.009 nm or better at 200 nm.
Multielement Standards: Ar, Be, Cd, Cr, Pb, Hg, Ni, Se, Tl, Al, Ba, Bi, B, Ca,Co, Cu, Ga, In, Fe, Li, Mg, Mn, K, Ag, Na, Sr, Zn
Sample Type: Aqueous sample or a minimum of 5 mg of solid sample is required.
Microwave Digester: Solid samples can be digested.
Application: multiple metals can be detected in a sample.
Minimum Volume: 15 ml is required for digestion for a solid sample.
ICP-OES Job Requisition form (External): Download

Make&Model: Enil_SS-F5-3A
Specification:
AAA class Certified IEC 60904-9 (2007) and ASTM E927-5
Temporal In Stability: < 2%( IEC/ASTM Class A) , Provides stable output over time
Spectral Non-uniformity: < 2% (IEC/ASTM Class A)
Spectral Mis-match: AM 1.5G, < ±25% (IEC/ASTM Class A)
Effective irradiance area: 50mm x 50mm
Spectral Range: 400nm to 1100nm
Spectral Grade: A++
Lamp: 300W Xenon lamp with optical reflector
Lamp Lifespan: Xenon lamp exceeds 1,000 hours
Divergent angle: <30
Irradiance intensity: 1000W/m2 @ AM1.5G (+/- 10% Lamp power control)
Light intensity: Adjustable from 0.1 sun to 1.2sun
Compatible with substrates upto .2mm thickness
Suitability: Especially suitable for precise testing of perovskite/crystalline silicon tandem solar cells due to adjustable spectrum performance

Make&Model: Enil_QE-R
Specification:
Quick measurement from 300 – 1100 nm (10nm interval) within 2 min
System will be able to measure AC and DC measurements
Average measurement Repeatability ≥ 99%
Repeatability of short-circuit current density is ≧ 99.6%.
Lamp Wavelength Range: Covers 300 nm to 2500 nm, accommodating a wide spectrum for testing versatility.
Measuring Wavelength Range: Offers flexibility with ranges of 300 nm to 1100 nm, 300 nm to 1800 nm, and 300 nm to 2500 nm.
Beam Spot Area: Provides precise measurement with a compact 1 x 1 mm² beam spot area.
Effective Working Distance: Ensures operational convenience with an effective working distance greater than 10 cm.
Light Source: Xenon lamp or other suitable light source
Sample Size: Accommodates various sample sizes

Make&Model: Vacuum Techniqes / LABPRO1800
Specification:
Number of Glove Ports LABPRO 1800: 4
Dimensions- 1800mm (Length) x 900mm (Height) x 780mm (Depth)
Volume: 1.3 cubic meter
Leak Rate- <= 0.05 Vol%/h (according to International Standards ISO 10648-2)
Glove Port- 220mm (Diameter)
Gloves- Butyl, 0.4-0.6mm thickness
Main-Antechamber- 400mm (Diameter) x 600mm (Length)
Purification: Oxygen- < 1 ppm, ~35 liters removal capacity
Purification: Moisture- < 1 ppm, ~1500g removal capacity
Pressure control- Automatic pressure control adjustable between -15 to +15mbar